?
Introduction to 128, 128L, 128LC2C Product Line for Film Stress Measurement
128 128L 128LC2C薄膜應力測試產品簡介
128, 128L, 128C2C Product Line Introductions介紹
? Product Pictures產品圖片
? Basic principles of 128 Line? 128產品系列基本原理
? Film Stress薄膜應力
? Dual laser scanner雙激光掃描
? Stoney equation for film stress薄膜應力Stoney方程式
? Who needs the products?誰需要這種產品？
? Film property monitor and/or R&D薄膜性能監(jiān)測及研發(fā)
? What are the simple specifications?什么是基本參數(shù)？
? Film stress range / reproducibility薄膜應力范圍/可再生性
?
128 Film Stress and Flatness Measurement Models ( Room Temperature )
薄膜應力和平整度測試設備（室溫）
?
Film Stress & Wafer Yield薄膜應力和硅片領域
What causes Film Stress ?什么導致了薄膜應力？
When a thin film is deposited onto a substrate like a flat wafer - mechanical stress will be induced .
薄膜沉積到基板（比如說硅片平面）上時-會產生一個機械應力。
This is exhibited as a wafer bow, where the film will be under tension / “Stress”
這樣會表現(xiàn)出一個硅片上的弓起，薄膜就會在張力和壓力下。
?
How Residual Stress is created? 剩余應力是如何產生的？
?
Problems caused by Stress 應力導致的問題
When induced stress exceeds the strength of the deposited film ....
如果產生的應力超過了沉積薄膜的強度….
Cracking of deposited film沉積薄膜開裂
Delamination & Buckling of film stack薄膜堆棧分層&翹曲
Metallization hillocks金屬化小丘
Voids空隙
All lead to yield loss ($$$)這些導致?lián)p失
?
Principle of Film Stress Measurement 薄膜應力檢測原理
?Technology for FSM Stress and Wafer bow Measurements
應力和硅片翹曲測量技術
Non Destructive Contactless Method
無損害非接觸式方法
Optilever laser scanning? (Patented) Optilever激光掃描（專利）
?
Procedure for Thin Film Stress Measurement or Map 薄膜應力檢測或映射步驟
1.?? Pre-Measure預檢測
Measure bare wafer surface profile(First Scan or Map )
裸露的硅片表面輪廓測量（第一次掃描或映射）
Deposit Thin Film淀積薄膜
2.?? Post-Measure后檢測
Measure surface profile after film deposition (Second Scan or Map )
薄膜淀積之后表面輪廓測量（第二次掃描或映射）?
?